It has broad application prospect in the following fields such as microelectronics , photoelectronic devices , large screen flat panel display , field emitter array , acoustic surface wave device , photon crystal , light waveguide array , holographic honeycomb lens and micro - optical element array , micro - structure manufacture , fabrication of large area grating and grid of high resolution , photoresist performance testing , profile measurement and metrology , etc . the paper only involves the primary research of interferometric lithography 在微電子、光電子器件、大屏幕平板顯示器、場發(fā)射器陣列、表面聲波器件、光子晶體、光波導(dǎo)陣列、全息透鏡和微光學(xué)元件陣列、微結(jié)構(gòu)制造,高分辨、大面積光柵和網(wǎng)格制造,在抗蝕劑性能測試、面形測量和計量等領(lǐng)域,干涉光刻技術(shù)都具有廣闊的應(yīng)用前景。